ChainThink 消息,7 月 27 日,据 The Information 援引知情人士报道,一家获中国国有资本支持的企业已开始量产自主研发的 DUV(深紫外)光刻机制造设备。
据悉,该企业计划于 2026 年生产约 5 台 DUV 光刻机,并在 2027 年扩大至约 20 台。作为对比,ASML 去年交付 131 套浸没式 DUV 光刻系统。
消息人士称,这批国产 DUV 光刻机计划交付给中芯国际、华虹半导体及长鑫存储等中国主要芯片制造商。其中,长鑫存储预计将成为国产先进半导体制造设备的重要应用方。
Disclaimer: Contains third-party opinions, does not constitute financial advice
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